
==== Front
Heliyon
Heliyon
Heliyon
2405-8440
Elsevier

S2405-8440(24)12996-9
10.1016/j.heliyon.2024.e36965
e36965
Research Article
High efficiency wide gap Cu(In,Ga)Se2 solar cells: Influence of buffer layer characteristics
Cheng Shiqing kaola120120@163.com

College of Physics and Electronic Science, Shanxi Datong University, Shanxi, 037009, China
27 8 2024
15 9 2024
27 8 2024
10 17 e3696529 5 2024
2 8 2024
26 8 2024
© 2024 The Author. Published by Elsevier Ltd.
2024

https://creativecommons.org/licenses/by/4.0/ This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
Wide-gap Cu(In,Ga)Se2 (CIGS) solar cells exhibit a superior match to the solar spectrum, resulting in a higher ideal efficiency (Eff). However, in reality, their device Eff is lower than that of narrow-gap CIGS solar cells. This study aims to identify the factors that limit the performance enhancement of wide-gap CIGS solar cells, focusing on the characteristics of the buffer layer. The influence of the thickness and doping concentration of the CdS layer on the built-in electric field and interfacial recombination of the heterojunction has been investigated through simulation. The simulation results indicate that when the doping concentration of the CdS layer is lower than or similar to that of the CGS layer, decreasing the thickness of the CdS layer (e.g., 10 nm) is beneficial for improving device performance. However, if it is higher than that of the CGS layer, increasing the thickness of the CdS layer (e.g., 50 nm) is conducive to improving device performance. The thickness of the CdS layer that maximizes the Eff of the wide-gap CGS device should be approximately 50 nm, and its doping concentration should be higher than that of the CGS layer. This optimization can simultaneously enhance the built-in electric field of the heterojunction and minimize its interfacial recombination, thereby improving the open-circuit voltage and Eff of wide-gap CGS devices.

Highlights

• Buffer properties impact built-in electric field and recombination in CGS solar cells.

• Lowering CdS thickness boosts η when doping content is low or similar to CGS layer's.

• Increasing CdS thickness boosts η when doping content surpasses the CGS layer's level.

Keywords

Thin film solar cells
CIGS
Wide bandgap
Interfacial recombination
High efficiency
==== Body
pmc1 Introduction

In recent years, CIGS thin-film solar cells have been widely used in large-scale industrial production. Ideal terrestrial solar cells should have a wide bandgap of 1.5 eV or higher to match the solar spectrum [[1], [2], [3]]. Therefore, in the case of CIGS solar cells, their absorber should have a high Ga/(Ga + In) ratio (GGI ≥0.8) to achieve a bandgap of 1.5 eV. In addition to their high ideal efficiency (Eff), wide-gap CIGS solar cells exhibit high open-circuit voltage (VOC), low short-circuit current density (JSC), and an optimal temperature coefficient. These features are beneficial for reducing losses caused by the interconnection between individual cells, making them more suitable for large-area modules. Moreover, wide-gap CIGS solar cells are suitable for space applications owing to their strong antiradiation abilities, which can effectively help reduce VOC losses in space devices. However, in reality, CIGS solar cells with a narrow bandgap (1.15–1.2 eV) and a GGI of 0.3–0.4 are the most efficient [[4], [5], [6], [7], [8], [9]]. The main reasons for the low Eff of wide-bandgap CIGS solar cells are (1) high deep-level defect concentration [1,10] and low carrier collection [11] and (2) high interfacial [[12], [13], [14]] and bulk recombination [15,16], which limits the increase in the VOC of devices. Therefore, the performance of wide-bandgap CIGS solar cells needs to be improved considerably. Setareh et al. used KF-PDT to enhance carrier collection and reduce CIGS/CdS heterojunction interfacial recombination, thereby increasing VOC, JSC, and Eff of wide-bandgap CIGS solar cells [17]. Miguel et al. improved the grain boundary properties of wide-bandgap CIGS films by increasing the substrate temperature to 600°C-650 °C. Using this approach, they reduced the recombination loss of the absorber, thereby improving the VOC and Eff of the CIGS device [18]. Kanevce et al. proposed that the surface inversion of the wide-bandgap CIGS absorber could help improve device performance [12]. Larsson et al. used the adjustable bandgap Zn1−xSnxOy buffer layer to match the bandgap with a CGS thin film, thereby considerably improving the VOC and performance of CGS devices [19]. Moustafa et al. used an adjustable bandgap ZrSxSe2−x buffer layer and MoSe2 interfacial layer to improve the performance of CIGS solar cells [[20], [21], [22]]. The aforementioned approaches help improve the performance of wide-bandgap CIGS solar cells by adjusting absorber characteristics (i.e., by changing surface characteristics or grain boundary characteristics) or improving the bandgap matching of heterojunctions. However, few studies have been conducted to improve the Eff of devices by simultaneously enhancing the built-in electric field and reducing interfacial recombination. Therefore, this study focuses on how to adjust buffer characteristics to address the aforementioned problem. We use wide-gap CGS cells to investigate the influence of CdS buffer layers with different doping concentrations and thicknesses on the built-in electric field and recombination of wide-bandgap CIGS solar cells [23]. Thus, we can identify the optimal thickness and doping concentration of the CdS film, which can enhance the built-in electric field of the heterojunction and minimize its interfacial recombination, thereby improving the performance of CGS solar cells. Simulation results indicate that for wide-gap CGS thin-film solar cells, when the CdS film doping concentration is lower or similar to that of the CGS thin film, decreasing the thickness of the CdS film (e.g., 10 nm) is beneficial to improving CGS device performance. However, when the doping concentration of the CdS film is higher than that of CGS film, increasing the thickness of the CdS film (e.g., 50 nm) to a certain extent can help improve the performance of CGS devices. To maximize the performance of CGS devices, the doping concentration of CdS thin films should be higher than that of CGS thin films, while increasing the thicknesses of the CdS thin films accordingly.

2 Methods: simulation

Herein, the SCAPS simulation software [24,25] is used to analyze the effects of thickness and doping concentration of the CdS layer on the performance of CGS devices. This analysis focuses on two aspects. First, the effect of the CdS film thickness on the built-in electric field and the recombination of CGS devices is studied. Second, the effect of doping concentrations of CdS films on the built-in electric field and the recombination of CGS devices is investigated. The thicknesses and doping concentrations (ND) of the CdS films range from 10 to 100 nm and 1015–1017 cm−3, respectively. The doping concentration of the CGS absorber (NA) is 1016 cm−3. The interface defects of the CGS/CdS interface are neutral, with electron and hole capture cross sections of 10−13 cm−2. The distribution of interface defects is single, with a total defect density of 1012 cm−2. The interface defect energy level (Et) is located 0.8 eV above EV, with electron and hole interface recombination rates (Sn/Sp) of 106/s. Moreover, the defects of the films in the simulation are neutral, with a defect density of 1014 cm−3. The defect energy level Et is located 0.6 eV above EV. The other parameters of the simulation are listed in Table 1. The absorption coefficient curves of the materials used in the simulation are depicted in Fig. S1, sourced from internal SCAPS data.Table 1 Material parameters used in simulation [23,[26], [27], [28]].

Table 1Layer	window	window	Buffer	Absorber	
parameter	Al-ZnO	i-ZnO	CdS	CGS	
Eg (eV)	3.5	3.5	2.4	1.68	
ND (cm−3)	1018	1016	1015,1016,1017	1016	
χ (eV)	4.42	4.42	4.2	3.68	
Thickness(nm)	350	50	10,30,50,100	2000	
ε/ε0	10	10	10	13.6	
NC[cm−3]	1 × 1018	1 × 1018	1 × 1018	1 × 1018	
NV[cm−3]	1 × 1019	1 × 1019	1 × 1019	1.8 × 1019	
μn[cm2/(Vs)]	100	100	100	100	
μp[cm2/(Vs)]	25	25	25	25	
υtn[cm/s]	1 × 107	1 × 107	1 × 107	1 × 107	
υtp[cm/s]	1 × 107	1 × 107	1 × 107	1 × 107	

3 Effect of CdS layer characteristic on the performance of CGS devices

3.1 Effect of CdS layer thickness on the performance of CGS devices

Fig. 1a shows the band diagram of CGS solar cells with CdS layer doping concentrations of 1015–1017 cm−3 and thicknesses of 10–100 nm. According to Fig. 1a–c and equation (1) [29], when the doping concentration of the CdS film is confirmed (i.e., 1015–1017 cm−3), the built-in electric field Vbi of CGS solar cells increases with an increase in the thickness of the CdS film. This approach is beneficial for improving the VOC of the device (Fig. 1a).qVbi=Eg,a−Ep,a−En,w+ΔECa,b+ΔECb,w……………………(1)[29]

(Eg,a is the energy band of CGS absorber, Ep,a is the difference between Fermi level Ef and EV,CGS, En,w is the difference between Ec,w (bulk) and Ef, ΔEca,b=χCGS−χCdS, ΔECb,w=χCdS-χi−ZnO)Fig. 1 CGS solar cell energy band diagram of CdS buffer layer with different doping concentrations (a) 1015 cm−3 (b) 1016 cm−3 (c)1017 cm−3 and thickness (10 nm, 50 nm and 100 nm).

Fig. 1

The VOC of CGS devices is influenced by the built-in electric field and interfacial and bulk recombination. Interfacial recombination and bulk recombination are related to the built-in electric field and external circuit. Therefore, when studying the influence of increasing CdS layer thickness on the VOC of the device, it is necessary to consider not only the role of the built-in electric field within the heterojunction but also the influence of external bias on recombination. As the total electric field within the heterojunction weakens under high bias, the role of recombination becomes more significant. Hence, we uniformly investigate the influence of CdS layer thickness on the CdS/CGS heterojunction recombination under a high bias of 0.4 V (near VOC) to further understand its influence on the VOC of the device.

Table 2 and Fig. S2 indicate that when the doping concentration of the CdS layer (1015 cm−3) is lower than that of the CGS layer (1016 cm−3), the interfacial recombination (Jifr) (0.4 V) decreases with an increase in its thickness. This decrease in interfacial recombination (Jifr) (0.4 V) leads to a decrease in the total recombination (Jtot-rec) (0.4 V), which helps increase the VOC of the device. This is consistent with the results shown in Fig. 2a, where the VOC increases with an increase in the CdS layer thickness, in the case where the doping concentration of the CdS layer (1015 cm−3) is lower than that of the CGS layer (1016 cm−3). When the doping concentration of the CdS layer (1016 cm−3) is similar to that of the CGS layer, the interfacial recombination (Jifr) (0.4 V) first decreases (50 nm) and then increases (100 nm) with an increase in its thickness, resulting in a similar trend regarding the total recombination (Jtot-rec) (0.4 V) (Table 2 and Fig. S3). This may explain the observed trend illustrated in Fig. 2a, where the VOC first increases (50 nm) and then decreases (100 nm) with an increase in the CdS layer thickness, in the case where the doping concentration of the CdS layer is similar to that of the CGS layer (1016 cm−3). When the doping concentration of the CdS layer (1017 cm−3) is higher than that of the CGS layer, the interfacial recombination(Jifr) (0.4 V) and total recombination (Jtot-rec) (0.4 V) first decrease (50 nm) and then increase (100 nm) with an increase in the thickness of the CdS layer. However, in this case, the VOC of the device increases with an increase in the thickness of the CdS layer (Fig. 2a and S4). The reason for the increase in VOC may be attributed to the strong built-in electric field (Fig. 1), despite the increase in the heterojunction interfacial recombination (Jifr)(0.4 V) with a CdS layer thickness of 100 nm.Table 2 The impact of CdS thickness and doping concentration on various recombination currents density at high bias voltage (0.4 V). Jtot-rec, Jbulk, and Jifr representing the total recombination current density, bulk recombination current density, and interface recombination current density, respectively.

Table 2Doping concentration	Thickness (10 nm)	Thickness (50 nm)	Thickness (100 nm)	
ND (cm−3)	Jtot-rec (mA/cm2)	Jbuk (mA/cm2)	Jifr (mA/cm2)	Jtot-rec (mA/cm2)	Jbuk (mA/cm2)	Jifr (mA/cm2)	Jtot-rec (mA/cm2)	Jbuk (mA/cm2)	Jifr (mA/cm2)	
1015	18.1	8.80	9.22	16.8	9.32	7.34	16.4	9.58	6.67	
1016	19.5	8.62	10.8	18.8	8.37	10.3	22	7.7	14.2	
1017	24	7.39	16.5	7.63	5.19	2.32	8.43	5.0	3.31	

Fig. 2 Effect of CdS buffer layer with different doping concentration(1015-1017 cm−3) and thickness (10–100 nm) on the solar cells parameters of CGS solar cells (NA ~ 1016 cm−3). (a) The open-circuit voltage (VOC), short-circuit current (JSC), fill factor (FF), and efficiency (Eff).

Fig. 2

The aforementioned analysis indicates that when the doping concentration of the CdS layer is confirmed (1015–1017 cm−3), an increase in its thickness to a certain extent (≤50 nm) is beneficial for improving the VOC of CGS devices. However, Fig. 2 indicates that the increase in the thickness of the CdS layer is unfavorable for enhancing the performance of CGS devices when the doping concentration of the CdS layer (1015 cm−3) is lower than or similar to that of the CGS layer (1016 cm−3). The decrease in JSC and fill factor (FF) contributes to the decrease in device performance under the aforementioned conditions. First, the weakening of light absorption in the CGS layer caused by the increase in the CdS layer thickness may contribute to the decrease in the JSC of the device. Second, Table 3 and Figs. S2 and S3 indicate that when the doping concentration of the CdS layer (1015 cm−3) is lower than or similar to that of the CGS layer (1016 cm−3), the increase in the thickness of the CdS layer leads to an increase in interfacial recombination (Jifr) (0 V) and bulk recombination (Jbulk) (0 V) under short-circuit conditions, which may contribute to the decrease in the JSC of the device. The decrease in FF caused by the increase in the CdS layer thickness (≤50 nm) (Fig. 2c) is attributed to the increase in Rs (Figs. S2a and S3a). Figs. S2a–d and S3a–d confirm that the increase in Rs is associated with the decrease in values of |ΔJifr|ΔV near VOC.Table 3 The impact of CdS thickness and doping concentration on various recombination currents density during short-circuit conditions. Jtot-rec, Jbulk, and Jifr representing the total recombination current density, bulk recombination current density, and interface recombination current density, respectively.

Table 3Doping concentration	Thickness (10 nm)	Thickness (50 nm)	Thickness (100 nm)	
ND (cm−3)	Jtot-rec (mA/cm2)	Jbuk (mA/cm2)	Jifr (mA/cm2)	Jtot-rec (mA/cm2)	Jbuk (mA/cm2)	Jifr (mA/cm2)	Jtot-rec (mA/cm2)	Jbuk (mA/cm2)	Jifr (mA/cm2)	
1015	5.92	5.66	0.15	6.91	6.32	0.47	9.46	6.91	2.44	
1016	5.82	5.56	0.15	6.17	5.73	0.33	6.18	5.63	0.44	
1017	5.24	4.85	0.27	5.92	3.79	2.01	6.77	3.67	2.98	

When the doping concentration of the CdS layer (1017 cm−3) is higher than that of the CGS layer, increasing the CdS layer thickness (≤50 nm) becomes beneficial for enhancing the performance of CGS devices. The primary reasons for this improvement include not only the increase in VOC but also the enhancement of FF. The main factors leading to the increase in FF are the increase in Rsh and the decrease in Rs (Fig. S4a). The increase in Rsh is related to the decrease in the values of |ΔJifr|ΔV and |ΔJbulk|ΔV near JSC (Figs. 4Sa–d). The decrease in Rs is associated with the increase in values of |ΔJifr|ΔV near VOC (Figs. S4a–d).

In summary, for CGS solar cells, when the doping concentration of the CdS layer is lower than or similar to the CGS layer, reducing the CdS layer thickness (such as 10 nm) is beneficial for enhancing the performance of the CGS device. When the doping concentration of the CdS layer is higher than that of the CGS layer, increasing its thickness (such as 30–100 nm) is conducive to improving the performance of the CGS device, and the optimal thickness for maximizing device performance should be approximately 50 nm.

3.2 The effect of CdS layer doping concentration on the performance of CGS devices

The aforementioned section demonstrates that the increase in the CdS film thickness can modify the built-in electric field and heterojunction recombination, thereby affecting the device Eff. This part focuses on the influence of the doping concentration of the CdS layer, with a constant thickness, on the built-in electric field and heterojunction recombination, thereby improving the device performance.

Increasing the doping concentration of the CdS layer is beneficial for enhancing the built-in electric field of the CdS/CGS heterojunction, thus improving the VOC of the device. However, as summarized in Table 2 and Fig. S5, when the thickness of the CdS film is 10 nm, an increase in doping concentration can lead to an increase in CdS/CGS heterojunction interfacial recombination (Jifr)(0.4 V) and total recombination (Jtot-rec)(0.4 V) under high bias, which is unfavorable for improving the VOC of the device. Overall, when the thickness of the CdS film is 10 nm, an increase in the doping concentration leads to a slight decrease in the VOC of the CGS device (Fig. 2a). Meanwhile, Fig. 2a illustrates that when the thickness of the CdS layer ranges from 30 to 100 nm, the VOC of the device first decreases (1016 cm−3) and then increases (1017 cm−3), as the doping concentration increases. As the device Eff is the highest when the CdS layer thickness is 50 nm, we use it as an example to investigate the influence of doping concentration in the CdS layer on the device parameters. As summarized in Table 2, at a CdS layer thickness of 50 nm, the CdS/CGS heterojunction interfacial recombination (Jifr)(0.4 V) increases when the doping concentration of the CdS layer increases to a level similar to that of the CGS layer (1016 cm−3) and decreases when the doping concentration of the CdS layer (1017 cm−3) increases higher than that of the CGS layer. Therefore, this could be the primary reason why, when the thickness of the CdS layer is within the range of 30–100 nm, as its doping concentration increases, the VOC of the device initially declines (when the doping concentration reaches 101⁶ cm⁻³), and subsequently rises (when the doping concentration further increases to 101⁷ cm⁻³).

The aforementioned analysis indicates that an increase in the doping concentration of the CdS layer has varying effects on the VOC of the device, depending on the thickness of the CdS layer. However, Fig. 2b–d shows that the increase in the doping concentration of the CdS layer prompts an increase in the JSC (except for 100 nm and 1017 cm−3) and FF of the device. Finally, when the thickness of the CdS layer is confirmed (10–100 nm), the increase in its doping concentration helps enhance the performance of the device. The increase in JSC with the doping concentration of the CdS layer is associated with a decrease in bulk recombination (Jbulk)(0 V) within the heterojunction under short-circuit conditions (Table 3 and Figs. S5 and S6). Although the FF of the device increases with an increase in the doping concentration of the CdS layer, the reasons for this increase vary. According to the I–V curve illustrated in Fig. S5a, when the thickness of the CdS layer is 10 nm, the primary reason for the increase in FF with the increase in doping concentration is the decrease in Rs. This decrease in Rs may be attributed to the increase in |ΔJJifr|ΔV near the VOC (Figs. S5 a-d). When the thickness of the CdS layer ranges from 30 to 100 nm, the primary reasons for the increase in the FF of the device with the increase in doping concentration are the increase in Rsh and the decrease in Rs. The increase in Rsh with the increase in the doping concentration of the CdS layer is associated with the decrease in |ΔJJifr|ΔV and |ΔJbulk|ΔV near the JSC. Simultaneously, the decrease in Rs is linked to the increase in |ΔJJifr|ΔV near the VOC (Figs. S6 a-d).

The aforementioned analysis indicated that when the thickness of the CdS layer is thin, such as 10 nm, with an increase in its doping concentration, the improvement in device Eff is primarily attributed to the improvement in the JSC and FF. When the thickness of the CdS layer is thick, such as 30–100 nm, and its doping concentration increases to a level similar to the CGS layer, the enhancement in the JSC and FF also becomes the primary reason for the improvement in device performance. When the thickness of the CdS layer ranges from 30 to 100 nm and its doping concentration exceeds that of the CGS layer, the VOC, JSC, and FF of the device considerably improve, and thus, the improvement in device performance is evident.

3.3 Comparing with experimental data

We investigate the effects of the thickness and doping concentration of the CdS buffer layer on the performance of wide-gap CIGS solar cells. As wide-gap CIGS solar cells belong to the CIGS solar cell family, adopting their experimental results can approximately verify the rationality of the simulation results. Standard solar cell parameters, including VOC, JSC, FF, and Eff, obtained from simulation and experimental data are listed in Table 4, Table 5. The experimental results listed in Table 4 reveal that as the thickness of the CdS layer increases, the CIGS device performance improves (the thickness of CdS layer increases to 50.8 nm), followed by a decline (the thickness of CdS layer increases to 122.9 nm) [30]. The device performance with a thick CdS layer (50.8 and 122.9 nm) is higher than that with a thin CdS layer (32.5 nm). The most appropriate thickness of the CdS layer leading to the optimal device Eff of CIGS solar cells is approximately 50 nm. These experimental results are similar to the simulation results obtained with a CdS layer doping concentration of 1017 cm−3. Meanwhile, the experimental results listed in Table 5 indicate that an increase in the doping concentration of the CdS layer (1016–1017 cm−3), when its thickness is maintained at 50 nm, is beneficial for enhancing the VOC, JSC, FF, and Eff of CIGSSe solar cells [31]. These experimental results are similar to the simulation results as well. Although the experimental and simulation results differ, they exhibit similar trends. Therefore, the simulation results indicate a certain degree of rationality.Table 4 Photovoltaic parameters of CIGS Solar cells with the doping concentration of 1017cm−3 and various thickness.

Table 4Sample	CIGS Thickness (nm)	VOC (mV)	JSC (mA)	FF (%)	Eff (%)	
Simulated	10	407	17.27	62.94	4.42	
30	558	16.62	65.92	6.11	
50	658	16.59	67.77	7.4	
100	664	15.72	67.48	7.05	
Experimental	32.5 [30]	502.1	34.3	47.54	8.19	
50.8 [30]	548.6	37.06	59.98	12.2	
122.9 [30]	545	34.04	61.66	11.44	

Table 5 Photovoltaic parameters of CIGS Solar cells with the thickness of 50 nm and various doping concentration.

Table 5Sample	CIGS doping (#/cm−3)	VOC (mV)	JSC (mA)	FF (%)	Eff (%)	
Simulated	1015	528.8	15.6	29.11	2.4	
1016	450	16.34	42.74	3.15	
1017	658	16.59	67.77	7.4	
Experimental	4.84 × 1016 [31]	656.3	30.7	67.1	13.52	
	2.92 × 1017 [31]	676.0	31	68.6	14.3	

4 Conclusion

This study considered wide-gap CGS solar cells to investigate whether changes in the properties of buffer layers could enhance the built-in electric field of the device and reduce the recombination at the heterojunction interface, thereby improving the Eff of CGS solar cells. We selected the most common CdS buffer layer for research. The aim is to determine the optimal parameters of the CdS layer that can enhance the built-in electric field, reduce heterojunction recombination, and improve device performance. This approach can help improve the performance of wide-gap CIGS solar cell devices using other buffer layers (such as Zn(O,S) and Zn(Mg,O)). Our analysis revealed that when the doping concentration of a CdS layer is lower than or similar to a CGS layer, the thickness of the CdS layer that optimizes the performance of the CGS device should be considerably reduced to ensure complete coverage (e.g., 10 nm). However, when the doping concentration of the CdS layer is higher than that of the CGS layer, the optimal thickness of the CdS layer for maximizing the performance of the CGS device should be thicker, for example, 50 nm. Besides the simulation results indicate that the increase in doping concentration of the CdS layer is also beneficial for enhancing the performance of CGS solar cell devices. Especially, when the CdS layer is thicker, such as 50 nm, and its doping concentration increases to higher than that of the CGS layer, the VOC, JSC, and FF of the device can be simultaneously improved, resulting in a more significant improvement in device performance. In summary, to optimize the performance of wide gap CIGS solar cells, the doping concentration of the CdS layer should be higher than that of the CIGS layer, and its thickness should be approximately 50 nm.

CRediT authorship contribution statement

Shiqing Cheng: Software.

Declaration of competing interest

We declare that we have no financial and personal relationships with other people or organizations that can inappropriately influence our work, there is no professional or other personal interest that could be construed as influencing the position presented in, or the review of, the manuscript entitled, “High efficiency wide gap Cu(In,Ga)Se2 solar cells：Influence of buffer layer characteristics ”.

Appendix A Supplementary data

The following is the Supplementary data to this article:Multimedia component 1

Multimedia component 1

Acknowledgements

The work was supported by the Science and Technology Innovation Project of Higher Education Institutions in Shanxi Province (Grant No. 2022L429 ), 10.13039/501100004310 Shanxi Datong University Doctoral Research Project (Grant No. 2021-B-04 ).

Appendix A Supplementary data to this article can be found online at https://doi.org/10.1016/j.heliyon.2024.e36965.
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